Plasma-chlorinated electrode and organic electronic devices using the same

Description:

A method is disclosed for elevating the work function of conductive layers such as indium tin oxide by chlorine-containing plasma exposure or etching. Also disclosed are electronic devices such as organic light-emitting diodes and organic photovoltaic cells with a chlorine plasma-treated conductive layer as the hole-injecting or hole-accepting electrode. The performance of the devices is enhanced due to an increased work function of the plasma-treated electrode.

Patent number

Patent Information:

Title	App Type	Country	Serial No.	Patent No.	File Date	Issued Date	Expire Date	Patent Status
Plasma-chlorinated electrode and organic electronic devices using the same	Provisional	*United States	61/611041		3/15/2012		3/15/2013	Expired
Plasma-chlorinated electrode and organic electronic devices using the same	Utility	*United States	US 13/803,398	8698135	3/14/2013	4/15/2014		Granted